JPS644838Y2 - - Google Patents

Info

Publication number
JPS644838Y2
JPS644838Y2 JP6204986U JP6204986U JPS644838Y2 JP S644838 Y2 JPS644838 Y2 JP S644838Y2 JP 6204986 U JP6204986 U JP 6204986U JP 6204986 U JP6204986 U JP 6204986U JP S644838 Y2 JPS644838 Y2 JP S644838Y2
Authority
JP
Japan
Prior art keywords
power
electrodes
carbon
power introduction
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6204986U
Other languages
English (en)
Japanese (ja)
Other versions
JPS62175071U (en]
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6204986U priority Critical patent/JPS644838Y2/ja
Publication of JPS62175071U publication Critical patent/JPS62175071U/ja
Application granted granted Critical
Publication of JPS644838Y2 publication Critical patent/JPS644838Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP6204986U 1986-04-23 1986-04-23 Expired JPS644838Y2 (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6204986U JPS644838Y2 (en]) 1986-04-23 1986-04-23

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6204986U JPS644838Y2 (en]) 1986-04-23 1986-04-23

Publications (2)

Publication Number Publication Date
JPS62175071U JPS62175071U (en]) 1987-11-06
JPS644838Y2 true JPS644838Y2 (en]) 1989-02-07

Family

ID=30895950

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6204986U Expired JPS644838Y2 (en]) 1986-04-23 1986-04-23

Country Status (1)

Country Link
JP (1) JPS644838Y2 (en])

Also Published As

Publication number Publication date
JPS62175071U (en]) 1987-11-06

Similar Documents

Publication Publication Date Title
KR100275597B1 (ko) 플리즈마처리장치
CA2092756A1 (en) Plasma cvd method and apparatus therefor
US5440206A (en) Plasma processing apparatus comprising means for generating rotating magnetic field
JPS61265820A (ja) プラズマ処理装置
JPS644838Y2 (en])
JPH0855699A (ja) プラズマ処理装置
JPH11330058A (ja) プラズマ処理装置
JPH09306694A (ja) 同時放電化装置
JPH05299382A (ja) プラズマ処理装置およびその方法
JPS5969141A (ja) 外熱形プラズマ化学気相生成装置の電極保持装置
JPS6247131A (ja) 反応性イオンエツチング装置
JPS6358920A (ja) プラズマ電極
JPH0551153B2 (en])
JP2726436B2 (ja) プラズム処理装置
JPH077792B2 (ja) プラズマ装置
JP2576590B2 (ja) オゾン反応器
JPS62219912A (ja) プラズマcvd装置
JP2902047B2 (ja) X線ct装置
JP2865329B2 (ja) イオン源用アーク電源保護回路
JPS6337615A (ja) プラズマ電極
JPH0734299A (ja) 金属製帯状支持体への給電装置
JPS6260026U (en])
JPS62252940A (ja) 半導体製造装置
JPS63247373A (ja) 薄膜形成方法及び装置
US20080248652A1 (en) Semiconductor manufacturing apparatus and manufacturing method of semiconductor device